IMPORTANT NOTICE : In reason of the coronavirus pandemic (Covid-19), the 13th Symposium SiO2 , previously scheduled on 2020 in Lille, will be organized on 14th-15th June 2021 as a free virtual conference.
You are cordially invited to participate for free in the 13th edition of the SiO2, Advanced Dielectrics and related Devices Symposium (SiO2 2021) to be held on 14th-15th June 2021 in visioconference.
The biennial SiO2 symposia series is an international forum on the science and technology of silica based systems, also including new related dielectrics and device applications. The series began in 1996 in Agelonde (France) and the last conference took place in Bari (Italy) in 2018. Exceptionnally, the 2021 meeting will be organized as a virtualconference by the “Laboratoire de Physique des Lasers, Atomes et Molécules” (PhLAM), University of Lille, CNRS. As a consequence, no fee will be due for your participation.
The objective of the symposium remains to provide a forum for the presentation and discussion of recent developments in the physics and chemistry of SiO2 and of novel dielectric materials in microelectronics, optics, photonics, etc… The conference also offers the opportunity to highlight future prospects in these fast-moving fields and to enhance exchanges and collaborations between scientists. Participation of young researchers (PhD) is especially encouraged.
Only oral communications are solicited, reporting on original research (both experimental and theoretical) in the following areas:
Electronic and atomic structure
Optical and electronic properties
Defect generation and transformation
Basic mechanisms and modeling
Radiation effects (including laser processing and harsh environments)
Dosimetry, sensors, radiation hardening
Micro-/nano-structuring
Fiber optics and fiber-based devices
Microelectronics
Optoelectronics, photonics
The organizing committee: Mohamed Bouazaoui, Bruno Capoen, Hicham El Hamzaoui, Christophe Kinowski. PhLAM CNRS UMR 8523, University of Lille