WELCOME

You are cordially invited to participate in the 13th edition of the SiO2, Advanced Dielectrics and related Devices Symposium (SiO2 2020) to be held on 14th-17th June 2020 in Lille, France.

The biennial SiO2 symposia series is an international forum on the science and technology of silica based systems, also including new related dielectrics and device applications. The series began in 1996 in Agelonde (France) and the last conference took place in Bari (Italy) in 2018. The 2020 meeting will be hosted by the “Laboratoire de Physique des Lasers, Atomes et Molécules” (PhLAM), University of Lille, CNRS.

The objective of the symposium is to provide a forum for the presentation and discussion of recent developments in the physics and chemistry of SiO2 and of novel dielectric materials in microelectronics, optics, photonics, etc… The conference also offers the opportunity to highlight future prospects in these fast-moving fields and to enhance exchanges and collaborations between scientists. Participation of young researchers (PhD) is especially encouraged.

Oral and poster communications are solicited reporting on original research (both experimental and theoretical) in the following areas:

  • Electronic and atomic structure
  • Optical and electronic properties
  • Defect generation and transformation
  • Basic mechanisms and modeling
  • Radiation effects (including laser processing and harsh environments)
  • Dosimetry, sensors, radiation hardening
  • Micro-/nano-structuring
  • Fiber optics and fiber-based devices
  • Microelectronics
  • Optoelectronics, photonics

The organizing committee: Mohamed Bouazaoui, Bruno Capoen, Hicham El Hamzaoui, Christophe Kinowski.
PhLAM CNRS UMR 8523, University of Lille

The 2020 SiO2 Symposium is supported by:

Logo ULille CNRSPhLAMRégionUFIiXBlue

Online user: 1 RSS Feed